Semiconductor and Electronics

Title: Global Extreme Ultraviolet Lithography (EUVL) Systems Market - Opportunity and Forecast, 2014-2022

  • ALL1051327
  • 150 Pages
  • February 2017
  • Semiconductor and Electronics

Extreme Ultraviolet Lithography (Euvl) Is One Of The Leading Next-Generation Lithography (Ngl) Technologies Used To Print Lines As Small As 30 Nm And Develop Microprocessors & Microchips. This Technology May Replace Optical Lithography, Which Is Used To Device Present-Day Microcircuits. Euvl System Works By Burning Strong Beams Of Ultraviolet Light That Are Reflected From A Circuit Design Pattern Into A Silicon Wafer.

The Ability Of The Euvl System To Offer Enhanced Resolving Power And High Productivity & Number Of Transistors, And To Produce Smaller Featured Devices Drive The Growth Of The Global Extreme Euvl Systems Market. However, Euvl Is A Complex Technology That Requires All New Step-And-Scan Systems For Production Of Semiconductors, Which Acts As A Restraint For The Market. Reduction In Size Of Transistors And Electronic Circuits Within Microprocessors Increases The Density And Power Of These Systems, Which Is Expected To Provide Lucrative Opportunity For The Market Growth.     

The Global Euvl Systems Market Is Segmented Based On Light Source, Tool, End User, And Geography. The Light Source Segment Is Divided Into Laser Produced Plasmas (Lpp), Vacuum Sparks, And Gas Discharges. On The Basis Of Equipment, The Market Is Categorized Into Light Source, Mirrors, Masks, Scanners And Others. By Application, It Is Classified Into Memory, Idm, Foundry, And Others. Geographically, It Is Analyzed Across North America (U.S., Mexico, And Canada), Europe (Uk, Germany, France, And Rest Of Europe), Asia-Pacific (China, India, Japan, And Rest Of Asia-Pacific), And Lamea (Latin America, Middle East, And Africa).

Major Companies Profiled In The Report Include Asml, Canon Inc., Intel Corporation, Nikon Corporation, Nuflare Technology Inc., Samsung Corporation, Suss Microtec Ag, Taiwan Semiconductor Manufacturing Company Limited (Tsmc), Ultratech Inc., And Vistec Semiconductor Systems.

Potential Benefits For Stakeholders

Comprehensive Analysis Of The Current Trends And Future Estimations In The Global Euvl Systems Market Is Provided.
The Report Offers A Competitive Scenario Of The Market With Growth Trends, Structure, Drivers, Scope, Opportunities, And Challenges.
It Includes A Detailed Analysis Of The Key Segments To Provide Insights On Market Dynamics.
Porter’s Five Forces Analysis Highlights The Potential Of Buyers And Suppliers As Well As The Competitive Structure Of The Market To Devise Effective Growth Strategies And Facilitate Better Decision-Making.

Extreme Ultraviolet Lithography (EUVL) Systems Market Key Segmentation

By Light Source

  • Laser Produced Plasmas (Lpp)
  • Vacuum Sparks
  • Gas Discharges

By Equipment

  • Light Source
  • Mirrors
  • Mask
  • Scanners
  • Others

By Application

  • Memory
  • Idm
  • Foundry
  •  Others

By Geography

  • North America
    • U.S.
    • Mexico
    • Canada
  • Europe
    • Uk
    • Germany
    • France
    • Rest Of Europe
  • Asia-Pacific
    • China
    • Japan
    • India
    • Rest Of Asia-Pacific
  • Lamea
    • Latin America
    • Middle East
    • Africa

Key Players

  • Asml
  • Canon Inc.
  • Intel Corporation
  • Nikon Corporation
  • Nuflare Technology Inc.
  • Samsung Corporation
  • Suss Microtec Ag
  • Taiwan Semiconductor Manufacturing Company Limited (Tsmc)
  • Ultratech Inc.
  • Vistec Semiconductor Systems

Other Players In The Value Chain Include (Profiles Not Included In The Report):

  • Globalfoundries
  • Ev Group
  • Mapper Lithography
  • Igi
  • Adama Innovations
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